Workshop on Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 September 2007
Publication date: 2007-09-23.
Citation:
A. Redondo-Cubero, J.A. Sánchez-García, R. Gago, L. Vázquez, J. Muñoz-Garcia, M. Castro, R. Cuerno, Surface nanodot patterning of amorphous silicon films by low-energy ion beam sputtering, Workshop on Nanopatterning via ions, photon beam and epitaxy, Sestri Levante (Italy). 23-27 September 2007.
